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Structural and electrical characteristics of ultra thin HfO2 gate oxide prepared by inductively couled rf magnetron sputtering system
초록
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- 제목
- Structural and electrical characteristics of ultra thin HfO2 gate oxide prepared by inductively couled rf magnetron sputtering system
- 저자
- 홍진표
- 발행일
- 2003-12-11
- 학회명
- The 3rd international conference on advanced materials and devices
- 개최지
- 제주도 라마다호텔