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The effects of RF powere on remote plasma atomic layer deposited Al2O3 passivation layer to improve the electrical stability of IGZO TFTs

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The effects of RF powere on remote plasma atomic layer deposited Al2O3 passivation layer to improve the electrical stability of IGZO TFTs
저자
전형탁
발행일
2011-05-26
학회명
2011 한국재료학회 춘계학술발표대회 및 제 20회 신소재 심포지엄
개최지
제주 휘닉스 아일랜드

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