Investigation of transparent conducting oxide/Si junction for the emitter wrap through solar cells

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초록

We have investigated properties of ITO/Si with shallow doped emitter for the increasing fill factor of emitter wrap through (EWT) solar cells. The ITO is prepared by DC magnetron sputter on p-type mono-crystalline silicon substrate. The contact resistance of ITO/Si with shallow doped emitter was measured by the transmission length method (TLM). As an experimental result, the contact resistance and the series resistance of ITO/Si with shallow doped emitter were obtained 0.0705 Ωcm2 and 0.1821 Ω;cm2, respectively. As a result of analysis by the contact resistance for optimization of ITO layer, the fill factor of EWT solar cells expected to increase above 80%.

키워드

Crystalline silicon substratesEmitter-wrap-throughFill factorMagnetron sputterP-typeSeries resistancesContact resistanceDC power transmissionMagnetron sputteringMagnetronsPhotovoltaic effectsSolar cells
제목
Investigation of transparent conducting oxide/Si junction for the emitter wrap through solar cells
저자
Song, J.-S.Yang, J.-Y.Lee, J.-S.Hong, J.-P.Ha, J.-H.
DOI
10.1109/PVSC.2010.5614405
발행일
2010-11
유형
Conference Paper
저널명
Conference Record of the IEEE Photovoltaic Specialists Conference
페이지
3611 ~ 3613