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Effects of N2 and N2O Post-Plasma Treatments on Hafnium Silicate Gate Dielectrics Grown by Remote Plasma Technique

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Effects of N2 and N2O Post-Plasma Treatments on Hafnium Silicate Gate Dielectrics Grown by Remote Plasma Technique
저자
전형탁
발행일
2007-10-08
학회명
212th ESC meeting, October 7-12
개최지
Hilton Washington, Washington, DC

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