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Barrier Characteristics of TaN films deposited by remote plasma enhanced atomic layer deposition(ALD) method using metal organic precursor

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Barrier Characteristics of TaN films deposited by remote plasma enhanced atomic layer deposition(ALD) method using metal organic precursor
저자
전형탁
발행일
2003-04-22
학회명
2003 MRS Spring Meeting
개최지
San Francisco Marriott & Argnet Hotel

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