Improvement in carrier mobility of ZnON transistor by tantalum encapsulation

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초록

The TaOx/ZnON thin-film stack showed a more uniform distribution of nanocrystalline ZnON with an increased stoichiometric anion lattice compared to control ZnON thin-films. Significantly, improved mobility of 89.4 cm2/Vs were achieved for TaOx/ZnON TFTs. This improvement can be explained by the removal and passivation effect of TaOx film on ZnON..

키워드

EncapsulationScavenging effectTantalum oxideThin-film TransistorsZinc oxynitrideHall mobilityHole mobilityNanocrystalsTantalumThin film transistorsThin filmsNanocrystallinesPassivation effectThin film stacksUniform distributionZinc compounds
제목
Improvement in carrier mobility of ZnON transistor by tantalum encapsulation
저자
Kim, MJJeong, JK
DOI
10.36463/idw.2019.0508
발행일
2019-11
유형
Conference Paper
저널명
Proceedings of the International Display Workshops
2
페이지
508 ~ 511