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Low Temperature Atomic Layer Deposited SiO2 Films Using Various Oxygen Reactants Plasma for Flexible Thin Film Encapsulation
- 제목
- Low Temperature Atomic Layer Deposited SiO2 Films Using Various Oxygen Reactants Plasma for Flexible Thin Film Encapsulation
- 저자
- 박진성
- 발행일
- 2019-08-29
- 학회명
- International Meeting on Information Display (IMID) 2019
- 개최지
- HICO, Gyeongju, Korea