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The suggestion of novel attenuated phase shift mask structure in Extreme Ultraviolet Lithography
- 제목
- The suggestion of novel attenuated phase shift mask structure in Extreme Ultraviolet Lithography
- 저자
- 안진호
- 발행일
- 2010-10-19
- 학회명
- 2010 International symposium on Extreme Ultraviolet Lithography
- 개최지
- Japan