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Enhancement of Surface Roughness of Relaxed SiGe layer-On-Insulator by using N2+H2 Annealing

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Enhancement of Surface Roughness of Relaxed SiGe layer-On-Insulator by using N2+H2 Annealing
저자
박재근
발행일
2012-04-25
학회명
2012년 한국물리학회 봄 학술논문발표회
개최지
대전컨벤션센터

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