상세 보기
- 제목
- Enhancing Etch Rate Selectivity between Si0.7Ge0.3- and Si-Film via Radical Concentration Control for Radical Oxidation-Based Wet Etchant
- 저자
- 박재근
- 발행일
- 2023-11-22
- 학회명
- Korean international semiconductor conference on manufactureing technology 2023
- 개최지
- 부산