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Characteristics of SiNx thin films by Remote Plasma Atomic Layer Depostion using DTDN2-H2 precursor

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Characteristics of SiNx thin films by Remote Plasma Atomic Layer Depostion using DTDN2-H2 precursor
저자
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발행일
2018-11-08
학회명
2018년도 한국재료학회 추계학술대회
개최지
여수 디오션 리조트

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