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초록

Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6″) as well as very fine patterns (0.35μm). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6″) and micro pattern (over 1.5μm) exposure. The other was for semiconductor applications which require small areas (1.5″) and nano pattern (under 0.2μm) exposure. However, holographic lithography can print fine patterns from 0.35μm to 1.5μm keeping the exposure area inside 6″. This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.

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