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Barrier Characteristics of TaN films deposited by remote plasma enhanced atomic layer deposition (PEALD) method using metal Organic Precursor

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Barrier Characteristics of TaN films deposited by remote plasma enhanced atomic layer deposition (PEALD) method using metal Organic Precursor
저자
전형탁
발행일
2004-02-19
학회명
제11회 한국반도체학술대회
개최지
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