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초록
A Cu nanoparticles/polyimide (PI) or Cu2O nanoparticles/PI hybrid materials were fabricated by curing at 350°C for 2 hours in H 2 or N2 atmosphere respectively, which resulted from the decomposition of the complex formed between a Cu film and the PI precursor, polyamic acid (PAA). Two kinds of PI films, thermosetting PI and thermoplastic PI were used. The A1 was deposited on the top PI as the top electrode and In as the bottom electrode was soldered on the back side of the samples. The memory effect of A1/PI/Cu (or Cu2O) nanoparticles/PI/p-type Si (100) structure will be also discussed with the results of the capacitance-voltage (C-V) measured at room temperature.
키워드
Bottom electrodes; Capacitance voltage; Cu films; Memory effects; Nanofloating gate memory; PI film; Polyamic acids; Polyimide film; Room temperature; Si(1 0 0); Hybrid materials; Nanoelectronics; Polyimides; Polymeric films; Thermosets; Copper
- 제목
- Formation of Cu or Cu2O nanoparticles embedded in a polyimide film for nanofloating gate memory
- 저자
- Choi, Dong Joo; Kim, Young-Ho
- 발행일
- 2010-03
- 유형
- Conference Paper
- 저널명
- INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
- 페이지
- 244 ~ 245