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- 제목
- Comparison of Colloidal Silica and Titanium Dioxide for Low Erosion and Dishing in Tungsten Chemical Mechanical Polishing
- 저자
- 박재근
- 발행일
- 2014-12-11
- 학회명
- The 17th International Symposium on the Physics of Semiconductors and Applications
- 개최지
- Ramada Plaza Jeju Hotel