Comparison of Colloidal Silica and Titanium Dioxide for Low Erosion and Dishing in Tungsten Chemical Mechanical Polishing

  • 박재근
제목
Comparison of Colloidal Silica and Titanium Dioxide for Low Erosion and Dishing in Tungsten Chemical Mechanical Polishing
저자
박재근
발행일
2014-12-11
학회명
The 17th International Symposium on the Physics of Semiconductors and Applications
개최지
Ramada Plaza Jeju Hotel