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Fabrication and evaluation of phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography
- 제목
- Fabrication and evaluation of phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography
- 저자
- 안진호
- 발행일
- 2019-02-27
- 학회명
- 2019 SPIE Advanced Lithography
- 개최지
- San Jose Convention Center, San Jose, California, USA