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electrical porperties of Al2O3/HfO2 stacked gate oxide formed by an off-axis rf remote plasmas oxidation method
- 제목
- electrical porperties of Al2O3/HfO2 stacked gate oxide formed by an off-axis rf remote plasmas oxidation method
- 저자
- 홍진표
- 발행일
- 2004-03-15
- 학회명
- Seoul international symposium on the physics of semiconductors and applications
- 개최지
- 한국 경주