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Thin Gate Oxides Prepared by Hydrogen-Assisted Low Pressure Radical Oxidation for DRAM Devices Designated to 300mm Wafers Mass Production
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- Thin Gate Oxides Prepared by Hydrogen-Assisted Low Pressure Radical Oxidation for DRAM Devices Designated to 300mm Wafers Mass Production
- 저자
- 안진호
- 발행일
- 2005-02-24
- 학회명
- 제12회 한국반도체학술대회
- 개최지
- 코엑스