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Novel Wet Oxidant for Highly Selective Etching of Si0.7Ge0.3- to Si-film Using Hydroxyl Radical Oxidation
박재근
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Novel Wet Oxidant for Highly Selective Etching of Si0.7Ge0.3- to Si-film Using Hydroxyl Radical Oxidation
저자
박재근
발행일
2023-11-22
학회명
Korean international semiconductor conference on manufactureing technology 2023
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