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Segregation Behavior of Copper and Tantalum in Oxide Film and Si Substrate after Device Heat-treatment

  • 박재근
제목
Segregation Behavior of Copper and Tantalum in Oxide Film and Si Substrate after Device Heat-treatment
저자
박재근
발행일
2012-10-10
학회명
222nd ECS Meeting
개최지
Hawaii Convention Center and the Hilton Hawaiian Village

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