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Characteristics of TiN Films Deposited by rf Remote Plasma Enhanced Atomic Layer Deposition (ALD) Method using Metal Organic Precursor

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Characteristics of TiN Films Deposited by rf Remote Plasma Enhanced Atomic Layer Deposition (ALD) Method using Metal Organic Precursor
저자
전형탁
발행일
2002-11-06
학회명
49th AVS International Symposium
개최지
Colorado Convention Center Denver, Colorado

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