상세 보기
- 제목
- Remarkable SiO2-Film Polishing-Rate Enhancement Using Wet-Ceria-Abrasives Based Chemical-Mechanical-Planarization Slurry and Radical Oxidation
- 저자
- 박재근
- 발행일
- 2023-11-22
- 학회명
- Korean international semiconductor conference on manufactureing technology 2023
- 개최지
- 부산