Fast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposure

초록

We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one. As a result, we can achieve not only the fast rising time and but also falling time.