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Electrical Characterization of Al2O3/ HfO2 Gate Oxide about the Various Thickness of Al2O3 Deposited by Atomic Layer Deposition

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Electrical Characterization of Al2O3/ HfO2 Gate Oxide about the Various Thickness of Al2O3 Deposited by Atomic Layer Deposition
저자
전형탁
발행일
2005-03-29
학회명
2005 MRS Spring Meeting
개최지
San Francisco

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