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Nanoscale surface engineering of high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma enhanced atomic layer deposition
- 제목
- Nanoscale surface engineering of high-k ZrO2/SiO2 gate insulator for high performance ITZO TFT via plasma enhanced atomic layer deposition
- 저자
- 박진성
- 발행일
- 2020-08-25
- 학회명
- IMID 2020