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High-removal selectivity through interaction between polyacrylamide and SiO2 film in poly isolation chemical mechanical planarization
- 제목
- High-removal selectivity through interaction between polyacrylamide and SiO2 film in poly isolation chemical mechanical planarization
- 저자
- 백운규
- 발행일
- 2007-07-09
- 학회명
- 2007 NanoSMAT
- 개최지
- Hotel Pestana Alvor Praia, Algarve, Portugal