상세 보기
Resistive switching characteristics of HfO2 film grown by atomic layer deposition technique
- 제목
- Resistive switching characteristics of HfO2 film grown by atomic layer deposition technique
- 저자
- 안진호
- 발행일
- 2006-07-24
- 학회명
- AVS 6th International Conference on Atomic Layer Deposition
- 개최지
- Korea, Seoul