Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)

Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
  • Shen, Tao
  • Mochi, Iacopo
  • Jeong, Dongmin
  • Mueller, Elisabeth
  • Ansuinelli, Paolo
  • ... Ahn, Jinho
  • 외 1명
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초록

This article [J. Micro/Nanopattern. Mater. Metrol., 23(4), 041402 (2024) https://doi.org/10 .1117/1.JMM.23.4.041402] was originally published online on 12 July 2024 with errors in Table 1 and in the Materials and Methods section. STEM measurements in the table and their corresponding mentions in the text were incorrect. The original table is shown below: (Table presented).

제목
Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)
제목 (타언어)
Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
저자
Shen, TaoMochi, IacopoJeong, DongminMueller, ElisabethAnsuinelli, PaoloAhn, JinhoEkinci, Yasin
DOI
10.1117/1.JMM.23.4.049801
발행일
2024-10
유형
Correction
저널명
Journal of Micro/ Nanolithography, MEMS, and MOEMS
23
4
페이지
1 ~ 2