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Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)
Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum)
Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
- Shen, Tao;
- Mochi, Iacopo;
- Jeong, Dongmin;
- Mueller, Elisabeth;
- Ansuinelli, Paolo;
- ... Ahn, Jinho;
- 외 1명
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This article [J. Micro/Nanopattern. Mater. Metrol., 23(4), 041402 (2024) https://doi.org/10 .1117/1.JMM.23.4.041402] was originally published online on 12 July 2024 with errors in Table 1 and in the Materials and Methods section. STEM measurements in the table and their corresponding mentions in the text were incorrect. The original table is shown below: (Table presented).
- 제목
- Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (vol 23, 041402, 2024)
- 제목 (타언어)
- Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank (Erratum) Erratum: Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank ([J. Micro/Nanopattern. Mater. Metrol. (2024) 23:4 (041402) DOI: 10.1117/1.JMM.23.4.041402)
- 저자
- Shen, Tao; Mochi, Iacopo; Jeong, Dongmin; Mueller, Elisabeth; Ansuinelli, Paolo; Ahn, Jinho; Ekinci, Yasin
- 발행일
- 2024-10
- 유형
- Correction
- 권
- 23
- 호
- 4
- 페이지
- 1 ~ 2
- 언어
- ENG
- 출판사
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
- 발행국가
- 미국
- 분량
- 2 페이지
- ISSN
- E 2708-8340
P 1932-5150