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Using platinum for absorber stack of phase shift mask in high numerical aperture extreme ultraviolet lithography
- 제목
- Using platinum for absorber stack of phase shift mask in high numerical aperture extreme ultraviolet lithography
- 저자
- 안진호
- 발행일
- 2017-11-06
- 학회명
- The 30th International Microprocesses and Nanotechnology Conference
- 개최지
- Ramada Plaza Jeju Hotel JEJU KOREA