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Characteristics of HfO2/Al2O3 Nano-laminate Films for Gate Dielectric Applicationsav

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Characteristics of HfO2/Al2O3 Nano-laminate Films for Gate Dielectric Applicationsav
저자
전형탁
발행일
2002-08-20
학회명
AVS Topical Conference On Atomic Layer Deposition
개최지
Hanyang Univ. Seoul. Korea

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