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Comparison Study of Crystallization and Thermal Stability of HfO2 Thin Film Deposited by Direct and Remote Plasma-Enhanced Atomic Layer Deposition

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Comparison Study of Crystallization and Thermal Stability of HfO2 Thin Film Deposited by Direct and Remote Plasma-Enhanced Atomic Layer Deposition
저자
전형탁
발행일
2006-04-20
학회명
2006 MRS spring meeting
개최지
San Francisco

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