ScholarWorks@한양대학교

상세 보기

Effect of Abrasive Size and Concentration on the Non-prestonian Behavior of Colloidal Silica Slurry and Its Influence on Wafer Polishing Process

  • 박재근
제목
Effect of Abrasive Size and Concentration on the Non-prestonian Behavior of Colloidal Silica Slurry and Its Influence on Wafer Polishing Process
저자
박재근
발행일
2002-10-21
학회명
한국물리학회 2004년도 임시총회 및 학술논문발표회
개최지
제주대학교(KOREA)

ScholarWorks@한양대학교

(04763) 서울특별시 성동구 왕십리로 222 Tel. +82-2-2220-1370 +82-2-2220-1366

COPYRIGHT © 한양대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.