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Characteristics of Thin Films Deposition of Ruthenium on Various SiO2 Substrates by Remote Plasma Atomic Layer Deposition

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Characteristics of Thin Films Deposition of Ruthenium on Various SiO2 Substrates by Remote Plasma Atomic Layer Deposition
저자
전형탁
발행일
2009-11-08
학회명
AVS 56th International Symposium & exhibition
개최지
San Jose, CA, USA

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