ScholarWorks@한양대학교

상세 보기

Effect of Alkaline Agent on Polishing Rate of Nitrogen-Doped Ge2Sb2Te5 Film in Chemical Mechanical Polishing

  • 박재근
제목
Effect of Alkaline Agent on Polishing Rate of Nitrogen-Doped Ge2Sb2Te5 Film in Chemical Mechanical Polishing
저자
박재근
발행일
2009-04-15
학회명
2009 MRS Spring Meeting
개최지
San Fransisco, CA

ScholarWorks@한양대학교

(04763) 서울특별시 성동구 왕십리로 222 Tel. +82-2-2220-1370 +82-2-2220-1366

COPYRIGHT © 한양대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.