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- 제목
- Characteristics of ZrO2/Al2O3 films for gate dielectric applications deposited by atomic deposition method
- 저자
- 전형탁
- 발행일
- 2003-11-07
- 학회명
- 3rd International Symposium on Designing, Processing and Properties of Advanced Engineering Material
- 개최지
- Jeju Island, Korea