Bias Generator for the scanning probe lithography

초록

Fabricating nanostructure using scanning probe microscope has an interesting research area of nano-science and technology. There are some factors - amplitude of applied voltage, bias type, humidity, temperature and electron exposure time etc.-scanning probe lithography. The bias generator was used to apply a bias voltage that synchronized with the cantilever motion through the signal of the PSPD(Poto Sensitive Photo diode) or the position signal of the X-Y scanner. By applying the modified bias voltage in the lithography mode, we ewre able to improve the lithography performance. This paper propses a bias generator with various bias voltages and presents the experiment results.