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Effect of H2O2 in Alkaline Slurry on Polishing Rate of Crystalline Ge2Sb2Te5 Film in Chemical Mechanical Planarization

  • 박재근
제목
Effect of H2O2 in Alkaline Slurry on Polishing Rate of Crystalline Ge2Sb2Te5 Film in Chemical Mechanical Planarization
저자
박재근
발행일
2009-11-30
학회명
2009 MRS Fall Meeting
개최지
Hynes Convention Center/Boston

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