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- 제목
- Characteristics of ZrO2 and HfO2 Gate Oxides Deposited by Atomic Layer Deposition (ALD) Using Metal Organic Precursors with Various Reactant Gas Sources
- 저자
- 전형탁
- 발행일
- 2002-12-30
- 학회명
- 49th AVS International Symposium
- 개최지
- Colorado Convention Center, Denver, Colorado