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Characteristics of Nickel Thin Film Deposited by plasma enhanced ALD using Ni(EtCp)2

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Characteristics of Nickel Thin Film Deposited by plasma enhanced ALD using Ni(EtCp)2
저자
전형탁
발행일
2012-04-11
학회명
2012 MRS Spring meeting
개최지
샌프란시스코, 미국

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