EUVL 포토마스크 오염제어 전략 및 수평유동에서의 오염평가 모델

초록

Gaussian Diffusion Sphere Model (GDSM) was developed to predict particulate contamination for an aerosol flow over a flat surface. Good agreement was found when the GDSM was compared with the well-known theories. GDSM can be extended to predict particulate contamination of EUVL masks in a parallel flow. Extending the GDSM to predict particulate contamination of a face-down wafer/mask is going on.

제목
EUVL 포토마스크 오염제어 전략 및 수평유동에서의 오염평가 모델
저자
육세진
발행일
2009-06-23
학회명
제3회 반도체공정 진단 Workshop
개최지
한국표준과학연구원, 대전