Improving Specific Contact Resistivity of a-IGZO Thin-Film-Transistors via Multi-stack Interlayer

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초록

We report the effects of sputter-based multi-stack interlayer on the electrical contact properties of a-IGZO TFTs. The a-IGZO TFTs with a multi-stack interlayer of TiN and IGTO showed remarkable outcomes, including the lowest specific contact resistivity (ρC) and the highest field-effect mobility (μFET). This research suggests a highly effective approach to reduce the contact resistivity of oxide semiconductors by nearly two orders magnitude.

키워드

Amorphous oxide semiconductorIGTOIGZOspecific contact resistivitythin-film transistorAmorphous filmsAmorphous semiconductorsIndium phosphideMOS devicesMOSFET devicesSemiconducting indium phosphideThin film circuits
제목
Improving Specific Contact Resistivity of a-IGZO Thin-Film-Transistors via Multi-stack Interlayer
저자
Jeong, Joo HeeYoon, Seong HunKim, TaikyuJeong, Jae Kyeong
DOI
10.1002/sdtp.17835
발행일
2024-06
유형
Conference paper
저널명
Digest of Technical Papers - SID International Symposium
55
1
페이지
1490 ~ 1491