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Platinum-based alloy absorber with improved etching properties for next-generation EUV mask
- 제목
- Platinum-based alloy absorber with improved etching properties for next-generation EUV mask
- 저자
- 안진호
- 발행일
- 2023-10-02
- 학회명
- 2023 SPIE Photomask Technology + EUV Lithography
- 개최지
- 미국