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Development of a 2D Axisymmetric PIC Simulation for Improved Plasma Uniformity in RF Etching Processes
- 제목
- Development of a 2D Axisymmetric PIC Simulation for Improved Plasma Uniformity in RF Etching Processes
- 저자
- 이정표
- 발행일
- 2025-06-12
- 학회명
- International Fusion and Plasma conference
- 개최지
- 대전 컨벤션센터