상세 보기
Effect of oxidant on properties of ultra thin HfO2 films grown by atomic layer deposition
- 제목
- Effect of oxidant on properties of ultra thin HfO2 films grown by atomic layer deposition
- 저자
- 안진호
- 발행일
- 2005-08-08
- 학회명
- AVS 5th International Conference on Atomic Layer Deposition
- 개최지
- San Jose, USA