Novel hybrid mask mold for combined nanoimprint and photolithography technique

Moon, Kanghun; Choi, Banglim; Park, In-Sung; Hong, Sunghun; Yang, Kihyun; Lee, Heon; Ahn, Jinho

doi:10.1016/j.mee.2006.01.055

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Novel hybrid mask mold for combined nanoimprint and photolithography technique

Moon, Kanghun;
Choi, Banglim;
Park, In-Sung;
Hong, Sunghun;
Yang, Kihyun;
... Ahn, Jinho;
외 1명

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3

초록

We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.

키워드

nanoimprint lithography; photolithography; hybrid mask mold; anti-sticking property; FLASH IMPRINT LITHOGRAPHY; STEP

제목: Novel hybrid mask mold for combined nanoimprint and photolithography technique

저자: Moon, Kanghun; Choi, Banglim; Park, In-Sung; Hong, Sunghun; Yang, Kihyun; Lee, Heon; Ahn, Jinho

DOI: 10.1016/j.mee.2006.01.055

발행일: 2006-04

유형: Article; Proceedings Paper

저널명: Microelectronic Engineering

권: 83

호: 4-9

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