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Fast response time patterned vertical alignment mode using double step UV exposure
- Kim, Dong-Ha;
- Kim, Youngsik;
- Lee, Jae Ho;
- Lee, You-Jin;
- Yu, Chang‐Jae;
- ... Kim, Jae-Hoon
Citations
SCOPUS
0초록
We propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one.
키워드
Active pixel; Alignment layers; Deformation energy; Double-step; Fast response time; Patterned vertical alignment; Reactive mesogen; Ultraviolet exposure
- 제목
- Fast response time patterned vertical alignment mode using double step UV exposure
- 저자
- Kim, Dong-Ha; Kim, Youngsik; Lee, Jae Ho; Lee, You-Jin; Yu, Chang‐Jae; Kim, Jae-Hoon
- 발행일
- 2012-12
- 유형
- Conference Paper
- 저널명
- Proceedings of the International Display Workshops
- 권
- 1
- 페이지
- 123 ~ 125
- 언어
- ENG
- 분량
- 3 페이지
- ISSN
- P 1883-2490