Hole mobility behavior in strained SiGe-n-SOI p-MOSFETs

Shim, Tae-Hun; Kim, Seong-Je; Lee, Gon-Sub; Kim, Kwan-Su; Cho, Won-Ju; Park, Jea-Gun

doi:10.1149/1.2911516

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Hole mobility behavior in strained SiGe-n-SOI p-MOSFETs

Shim, Tae-Hun;
Kim, Seong-Je;
Lee, Gon-Sub;
Kim, Kwan-Su;
Cho, Won-Ju;
외 1명

Citations

SCOPUS

2

초록

A compressive strained SiGe channel grown-on-SOI structure which can be applicable to next generation high performance CMOSs was applied to p-MOSFETs. The mobility behavior depending on effective fields, Eeff, was investigated by varying Ge concentrations in the SiGe layer. We confirmed that the mobility enhancement factor increases with both Ge concentration and E eff, and quite depends on Eeff. In particular, we demonstrated that hole mobility enhancement factor at the effective fields of 0.13 MV/cm amounted to 1.51 for 34 at% Ge. In addition, we observed that the strain of 0.23 induced by 56.5-at% Ge concentration in SiGe grown-on-SOI structure could not increase hole mobility at the effective fields range from 0.05 to 0.13 MV/cm because of high density of dislocations.

키워드

Effective fields; Ge concentrations; High densities; Mobility behaviors; Mobility enhancements; Mos fets; SiGe channels; SiGE layers; Soi structures; Concentration (process); Germanium; Hole concentration; Logic gates; MOSFET devices; Semiconducting germanium compounds; Semiconducting silicon compounds; Silicon; Silicon alloys; Single crystals; Hole mobility

제목: Hole mobility behavior in strained SiGe-n-SOI p-MOSFETs

저자: Shim, Tae-Hun; Kim, Seong-Je; Lee, Gon-Sub; Kim, Kwan-Su; Cho, Won-Ju; Park, Jea-Gun

DOI: 10.1149/1.2911516

발행일: 2008-05

유형: Conference Paper

저널명: ECS Transactions

권: 13

호: 1

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