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Characteristics of Hafnium Aluminate Films for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method

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Characteristics of Hafnium Aluminate Films for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method
저자
전형탁
발행일
2003-11-03
학회명
AVS 50th International Symposium & Exhibition
개최지
Baltimore, Maryland,USA

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