Growth of GaN Columns and Microstructures on (111) Si by Using Ge Layer via Metal Organic Chemical Vapor Deposition

초록

We demonstrate the successful growth of GaN columnar and microdisk structures on a (111) Ge/Si substrate via metal organic chemical vapor deposition. X-ray diffraction and energy disperse spectroscopy results reveal that the well aligned GaN nanocolumnar structures are grown on a Si substrate by using the Ge layer. The relatively higher growth temperature induces a change in surface morphology of GaN from columnar to microdisk structures. The possible growth mechanism of columnar structured GaN was considered from the Ga-metal/Ge eutectic materials system.

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