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Electrical and Chemical Analysis of Atomic Layer Deposited Al2O3 and 6H-SiC System Treated by Different NH3 Plasma Exposure Times
- 제목
- Electrical and Chemical Analysis of Atomic Layer Deposited Al2O3 and 6H-SiC System Treated by Different NH3 Plasma Exposure Times
- 저자
- 최창환
- 발행일
- 2012-07-05
- 학회명
- The Fourth International Conference on Microelectronics and Plasma Technology (ICMAP)
- 개최지
- Jeju, Korea